UV laser marking machine(MZ-3UV/MZ-5UV/MZ-10UV/MZ-15UV)
The reaction mechanism during laser processing is achieved through photochemical ablation, which relies on laser energy to break the bonds between atoms or molecules, causing them to vaporize or evaporate into small molecules. UV laser marking is characterized by a small focused spot and a wide range of applicable materials, primarily targeting the high-end market for precision processing.
1. Equipment Features
The reaction mechanism during laser processing is achieved through
photochemical ablation, which relies on laser energy to break the bonds between
atoms or molecules, causing them to vaporize or evaporate into small molecules.
UV laser marking is characterized by a small focused spot and a wide range of
applicable materials, primarily targeting the high-end market for precision
processing.
– Excellent beam quality, smaller focused spot, minimal thermal impact, and
delicate marking;
– Most plastic materials can absorb UV laser, compensating for the
insufficient processing capabilities of other lasers;
– High marking speed and efficiency;
2.EquipmentAppearance(Reference)

1) Overall Dimensions: Length 650mm * Width 800mm * Height 1500mm (subject to
actual external dimensions)
2) Chiller Dimensions: Length 580mm * Width 290mm * Height 470mm (subject to
actual external dimensions)
3) Total Weight: 120KG (subject to actual weight)
3. Technical Parameters
|
Item Name |
Technical Parameters |
|
Laser Average Power |
3W@30Hz/5W@30Hz/10W@50Hz |
|
Repetition Rate |
20KHz-200KHZ |
|
Pulse Width |
<15ns |
|
Laser Wavelength |
355nm |
|
Beam Quality M² |
<1.2 |
|
Beam Divergence Angle |
<2mrad |
|
Standard Engraving Range |
110mm*110mm/150mm*150mm/174mm*174mm(optional) |
|
Recommended Engraving Speed Speed |
≤5000mm/s |
|
Minimum Line Width |
0.01mm((depending on material and lens size) |
|
Repetition Accuracy |
±0.05mm |
|
Power Requirements |
220V±22V / 50Hz / 10A |
|
Total Power Consumption |
≤1000W |
|
Cooling Method |
Water Cooling |
4. Hardware Configuration
|
Optical System |
UV laser |
3W/5W/10W |
china |
Integrated UV Laser |
|
UV Galvanometer |
10mm |
china |
Zhibo,Ouye,or Saipusen |
|
|
UV Focusing Lens |
F254 |
china |
Custom |
|
|
Contol System |
Marking Control Card |
EzCAD2 |
china |
BJJCZ |
|
Marking Software |
EzCAD2 |
china |
BJJCZ |
|
|
Industrial Computer |
PC |
china |
/ |
|
|
Display |
19-inch LCD |
china |
Founder or Dell |
|
|
Cooling System |
Constant Temperature Chiller |
CWUL |
china |
Teyu |
5. Sample Images
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|
Plastic Logo Marking |
Precision Exterior Part Marking |
Charger Marking |
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|
Plastic Shell Marking |
3C Product Marking |
Computer Keyboard Marking |
Samples Subject to Actual Results
6. Working Environment Requirements
1) Ambient temperature should be between 0-35°C, and air conditioning is
required;
2) Humidity should be between 45%-75%. No condensation is allowed, and a
dehumidifier should be installed;
3) Power supply requirements: 220V, 50Hz;
4) Power grid fluctuation: ±5%, and the grounding wire must comply with
international standards. In areas with voltage amplitude exceeding 5%, an
electronic automatic voltage and current stabilizer should be installed;
5) There should be no strong electromagnetic signal interference near the
installation site. Avoid radio transmission stations (or relay stations) in the
surrounding area;
6) Foundation vibration amplitude: recommended to be less than 50 µm;
vibration acceleration: recommended to be less than 0.05g. Avoid having a large
number of stamping or other machine tool equipment nearby;
7) The equipment space must be smoke-free and dust-free. Avoid environments
with severe dust, such as metal polishing or grinding;
8) Strict requirements for the quality of cooling water: purified water,
deionized water, or distilled water must be used. Tap water, mineral water, or
other liquids containing high levels of metal ions or minerals are not
allowed.












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